System and method to reduce metal series resistance of...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Bump leads

Reexamination Certificate

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C257S738000, C257S778000

Reexamination Certificate

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07432595

ABSTRACT:
Provided herein, in accordance with one aspect of the present invention, are exemplary embodiments of semiconductor chips having low metallization series resistance. In one embodiment, the semiconductor chip comprises a semiconductor substrate and a metallization structure formed on the semiconductor substrate; an under bump metallurgy (“UBM”) structure layer formed over the metallization structure; and a bump formed over said UBM layer; wherein the largest linear dimension of said UBM layer is larger than the diameter of said bump.

REFERENCES:
patent: 5904859 (1999-05-01), Degani
patent: 6586323 (2003-07-01), Fan et al.
patent: 6617655 (2003-09-01), Estacio et al.
patent: 6621164 (2003-09-01), Hwang et al.
patent: 6787903 (2004-09-01), Yang et al.
patent: 6800932 (2004-10-01), Lam et al.
patent: 6936923 (2005-08-01), Lin et al.
patent: 6972464 (2005-12-01), Shen
patent: 2003/0067073 (2003-04-01), Akram et al.
International Search Report for PCT/US04/040698, dated Aug. 8, 2005 (2 pgs.).
Written Opinion of the International Searching Authority for PCT/US04/040698, dated Aug. 8, 2005 (4 pgs.).

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