System and method to predict the state of a process...

Details System and method to predict the state of a process... System and method to predict the state of a process...

2006-10-24

2006-10-24

Picard, Leo (Department: 2125)

Data processing: generic control systems or specific application

Generic control system, apparatus or process

Sequential or selective

C700S121000

Reexamination Certificate

active

07127304

ABSTRACT:
The disclosed system and method relates to the prediction of processing tool control parameters, i.e. controller state, for a particular processing tool, which has little or no utilization history, i.e. is data starved or has not gone through the learning curve, for a given process, or has undergone an event for which the current controller state has been reset or is otherwise now sub-optimal. The prediction is based on the processing tool control parameters of a substantially similar processing tool, being used in a substantially similar fashion to the given situation, which has significant utilization history. The processing tool having significant utilization history may be the same processing tool as the processing tool with little or no processing history where a manufacturing event disrupts the operations thereof. In this case, the pre-event control parameters and utilization history may be used, according to the disclosed embodiments, to predict the post-event controller state. Effectively, the disclosed embodiments provide for the processing tool with little or no utilization history to inherit the controller state, i.e. the evolved control parameters, of the processing tool with significant utilization history. Thereby, the processing tool with little or no utilization history is spared having to go through the learning curve, and the associated costs in delay and resources, to arrive at a particular controller state, i.e. the processing tool does not have to go through the iterative process-evaluate-adapt procedure to refine its control parameters to achieve results within the desired specifications.

REFERENCES:
patent: 5640491 (1997-06-01), Bhat et al.
patent: 7053863 (2006-05-01), Glen et al.
patent: 2004/0049299 (2004-03-01), Wojsznis et al.
patent: 2005/0060426 (2005-03-01), Samuels et al.
patent: 2005/0063307 (2005-03-01), Samuels et al.
Moyne, Telfeyan, Hurwitz and Taylor, article entitled: “A Process-Independent Run-to-Run Controller and its Application to Chemical-Mechanical Planarization,” 1995 SEMI/IEEE Advanced Semiconductor Manufacturing Conference and Workshop, Aug. 15, 1995, 21 pages.

Affiliated with

Also associated with

Rating

System and method to predict the state of a process... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System and method to predict the state of a process..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method to predict the state of a process... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3711774