System and method of fabricating multiple holographic elements

Details System and method of fabricating multiple holographic elements System and method of fabricating multiple holographic elements

1995-06-07

1997-03-25

Henry, Jon W.

Optical: systems and elements

Holographic system or element

Copying by holographic means

359 25, 359 3, 430 2, G03H 120, G03H 130

Patent

active

056150229

ABSTRACT:
A method and system for fabricating a multiple holographic element. The method comprises the steps of forming a master multiple holographic element having an absorption grating pattern that produces a given index of refraction pattern across the master multiple holographic element, coating the master holographic element with a layer of a photopolymer, and directing a recording beam to and through the master holographic element and into the photopolymer layer. The absorption grating pattern of the master holographic element modulates the amplitude of the recording beam, and the modulated recording beam causes the monomers of the photopolymer to form a monomer pattern that produces the given index of refraction pattern across the photopolymer layer. The method further comprises the steps of fixing the monomers of the photopolymer layer in that monomer pattern to form thereby a copy of the multiple holographic element, and removing the photopolymer layer from the master holographic element.

REFERENCES:
patent: 4225211 (1980-09-01), Abe
patent: 4469407 (1984-09-01), Cowan et al.
patent: 4904033 (1990-02-01), Ikeda et al.
patent: 4942112 (1990-02-01), Monroe et al.
J. Nakjima et al, "Copied Phase Hologram of Photoresist", Fujitsu Sci. Tech. J. (Japan), vol. 6. No. 3, pp. 69-90, Sept., 1970.
M. J. Beesley et al, "The Use of Photoresist as a Holographic Recording Medium", Applied Optics, vol. 9, No. 12, pp. 2720-2724, Dec. 1970.

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