Cleaning and liquid contact with solids – Apparatus – With movable means to cause fluid motion
Reexamination Certificate
2007-12-11
2007-12-11
Kornakov, M. (Department: 1746)
Cleaning and liquid contact with solids
Apparatus
With movable means to cause fluid motion
C134S137000, C134S140000, C134S142000, C134S147000, C134S148000, C134S151000, C134S157000, C134S193000, C134S196000, C134S198000
Reexamination Certificate
active
10336631
ABSTRACT:
A system and method for cleaning a substrate, such as a semiconductor wafer, utilizes a rotatable wafer supporting assembly with a cylindrical body to provide stability for the substrate being cleaned, even at high rotational speeds. The rotatable wafer supporting assembly may include wafer holding mechanisms with pivotable confining members that are configured to hold the substrate using centrifugal force when the wafer supporting assembly is rotated. In an embodiment, the cleaning system may include a positioning system operatively connected to an acoustic transducer to provide meaningful control of the acoustic energy applied to a surface of the substrate by selectively changing the distance between the acoustic transducer and the substrate surface so that the substrate can be cleaned more effectively.
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Jeong In Kwon
Kim Jung-yup
Kim Yong Bae
Lee Yong Ho
Ham Thomas H.
Kornakov M.
Wilson & Ham
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