Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-12-26
2006-12-26
Lauchman, Layla G. (Department: 2877)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S311000, C355S030000, C355S053000
Reexamination Certificate
active
07153616
ABSTRACT:
A maskless lithography tool that includes a reference reticle having reference features for tuning and calibrating the tool. The reference reticle is illuminated by a illumination source to form a reference image of the reference features. A signal is applied to an active contrast device of the tool to form a die pattern that includes the reference features. The contrast device is illuminated by the illumination source to form a die image of reference features. An image scanner captures the reference image and the die image. A comparison of the images is used to make tuning and calibrating adjustments to the tool. The reference reticle can be used to debug and characterize the tool even when the operation of the contrast device is not completely understood because the reference features of the reference reticle are independent of the tool's contrast device and pattern generating data stream.
REFERENCES:
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5500736 (1996-03-01), Koitabashi et al.
patent: 5523193 (1996-06-01), Nelson
patent: 5530482 (1996-06-01), Gove et al.
patent: 5579147 (1996-11-01), Mori et al.
patent: 5677703 (1997-10-01), Bhuva et al.
patent: 5691541 (1997-11-01), Ceglio et al.
patent: 5808797 (1998-09-01), Bloom et al.
patent: 5982553 (1999-11-01), Bloom et al.
patent: 6122397 (2000-09-01), Lee et al.
patent: 6133986 (2000-10-01), Johnson
patent: 6177980 (2001-01-01), Johnson
patent: 6215578 (2001-04-01), Lin
patent: 6251550 (2001-06-01), Ishikawa
patent: 6312134 (2001-11-01), Jain et al.
patent: 6544698 (2003-04-01), Fries
patent: 6628372 (2003-09-01), McCullough et al.
patent: 6664012 (2003-12-01), Nunes
patent: 6687041 (2004-02-01), Sandstrom
patent: 6707534 (2004-03-01), Bjorklund et al.
patent: 6747783 (2004-06-01), Sandstrom
patent: 6794100 (2004-09-01), Boettiger et al.
patent: 6795169 (2004-09-01), Tanaka et al.
patent: 6806897 (2004-10-01), Kataoka et al.
patent: 6811953 (2004-11-01), Hatada et al.
patent: 7006196 (2006-02-01), Schroeder
patent: 2001/0033996 (2001-10-01), Lin
patent: 2003/0077089 (2003-04-01), Luellau
patent: 2003/0160980 (2003-08-01), Olsson et al.
patent: 2003/0190535 (2003-10-01), Fries
patent: 2004/0041104 (2004-03-01), Liebregts et al.
patent: 2004/0130561 (2004-07-01), Jain
patent: 2004/0239908 (2004-12-01), Bleeker et al.
patent: 2005/0007572 (2005-01-01), George et al.
patent: 2005/0047543 (2005-03-01), Sandstrom
patent: 2005/0074906 (2005-04-01), Kochersperger
patent: 2005/0219532 (2005-10-01), Mason
patent: 2006/0033902 (2006-02-01), Latypov et al.
patent: WO 98/04950 (1998-02-01), None
patent: WO 98/33096 (1998-07-01), None
patent: WO 98/38597 (1998-09-01), None
patent: WO 00/03307 (2000-01-01), None
“Micronic Laser Pattern Generators—Pattern Accuracy at the Speed of Light,”Micronic Laser Systems, dated Nov. 2002, 2 pages, downloaded on Dec. 26, 2003 from <http://www.micronic.se/site—swe/litteratur/pdf/Sigma—Omega—product—sheet.pdf> .
“A Little Light Magic,”IEEE Spectrum(Sep. 2003), pp. 34-39.
ASML Holding N.V.
Lauchman Layla G.
Sterne Kessler Goldstein & Fox PLLC
Underwood J
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