System and method for ventilation in the fabrication of...

Coating apparatus – Control means responsive to a randomly occurring sensed...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C118S715000, C156S345240, C285S013000, C285S014000, C285S121400

Reexamination Certificate

active

07033442

ABSTRACT:
In the fabrication of semiconductor integrated circuits, a ventilation system is disclosed which includes a sleeve device, a ventilator and a sensor. The sleeve device has at least one aperture thereon for gas transfer. The ventilator is coupled to the sleeve device. The sensor is coupled to the sleeve device. A method of ventilation is also disclosed, which includes a step of sensing a relative movement between a sleeve having at least aperture for gas transfer and a gas outlet connected to a pipeline, and a step of generating a signal to control a ventilator when the relative movement between the sleeve and the gas outlet is sensed.

REFERENCES:
patent: 4282743 (1981-08-01), Pickett
patent: 4325600 (1982-04-01), Nestor
patent: 5312137 (1994-05-01), Nee
patent: 5489124 (1996-02-01), Nee et al.
patent: 5831149 (1998-11-01), Webb
patent: 5957503 (1999-09-01), Brown
patent: 6234221 (2001-05-01), Clark, II
patent: 6326574 (2001-12-01), Huang et al.
patent: 6430988 (2002-08-01), Watanabe
patent: 2002/0023677 (2002-02-01), Zheng et al.
patent: 2002/0152797 (2002-10-01), McAndrew et al.
patent: 2003/0037901 (2003-02-01), Kamm et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

System and method for ventilation in the fabrication of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System and method for ventilation in the fabrication of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for ventilation in the fabrication of... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3572584

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.