Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1988-06-03
1989-11-21
Morgenstern, Norman
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
427 39, 427 47, 20419231, B05D 306, B05D 314, C23C 1400
Patent
active
048821985
ABSTRACT:
A substrate holder is mounted within the vacuum chamber for carrying at least one substrate; an electrically conductive crucible is positioned within said vacuum chamber and is electrically insulated therefrom but has a low electrical resistance connection therebetween. The crucible is adapted to contain a preselected material for evaporation onto a substrate on the substrate holder. A high voltage electron beam source is positioned within said vacuum chamber in the vicinity of said crucible and includes a high voltage electron gun and a deflection magnet system arranged for bending electrons from said gun into said crucible for evaporating the preselected material therein, the magnet system forms a magnet field of prearranged characteristics in the region above said crucible. A low voltage, high current plasma source, including a separate plasma generating chamber is positioned relative to said vacuum chamber to produce an intense first plasma of a selected activation gas species in said plasma generating chamber for injection into said vacuum chamber. The plasma source is positioned at any convenient location relative to the crucible and the electron beam source and is electrically interconnected with the crucible for current flow therebetween. The plasma source fills the vacuum chamber with a generally distributed plasma. The distributed plasma coacts with the magnetic field above said crucible and evaporant material leaving the crucible to form an intense second plasma in the region above said crucible, thereby activating the evaporant material passing through the region toward the substrate to produce a vacuum deposited thin film having improved thin film characteristics.
REFERENCES:
patent: 3984581 (1976-10-01), Dobler et al.
patent: 4361114 (1982-11-01), Gurev
patent: 4448802 (1984-05-01), Buhl et al.
patent: 4461689 (1984-07-01), Diepers
patent: 4526132 (1985-07-01), Ohta
patent: 4619748 (1986-10-01), Moll et al.
patent: 4676194 (1987-06-01), Satou et al.
patent: 4683149 (1987-07-01), Suzuki et al.
patent: 4707238 (1987-11-01), Okubo
Bunshah et al., Deposition Technologies for Films & Coatings, (Noyes Publications, Park Ridge, N.J.), c.1982, pp. 102-104 and 244-260.
Pulker et al., "Optical and Mechanical Properties of Ion Plated Oxide Films", pp. 299-306.
Berry et al., "Thin Film Technology", Evaporated Films, 1979, pp. 139-142.
Johnson Kim L.
Seddon Richard I.
Temple Michael D.
Bueker Margaret
Dalton Philip A.
Morgenstern Norman
Optical Coating Laboratory, Inc.
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