System and method for the holographic deposition of material

Coating apparatus – With vacuum or fluid pressure chamber – With means to apply electrical and/or radiant energy to work...

Reexamination Certificate

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C427S554000, C216S065000

Reexamination Certificate

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07568445

ABSTRACT:
An apparatus and method for hologram induced deposition of material for use in the formation of three-dimensional structures is described. An electromagnetic energy source may be directed in the form of a hologram to a process chamber with a medium. The medium may be an organometallic gaseous medium. The hologram may induce the medium to form a solid structure associated with the shape of the hologram. The pressure of the gaseous medium may range from subatmospheric to greater than 100 psi. Alternatively, the medium may be a liquid polymer, a solid particle, or others. The hologram may be formed with an LCD panel or other means. Further, a holographic movie may be projected into one or more mediums to form complex three-dimensional structures.

REFERENCES:
patent: 4333165 (1982-06-01), Swainson et al.
patent: 4340617 (1982-07-01), Deutsch et al.
patent: 4752455 (1988-06-01), Mayer
patent: 4950644 (1990-08-01), Schultz et al.
patent: 5017317 (1991-05-01), Marcus
patent: 5039656 (1991-08-01), Hidaka
patent: 5085166 (1992-02-01), Oka et al.
patent: 5169608 (1992-12-01), Watabe et al.
patent: 5364607 (1994-11-01), Tebbe et al.
patent: 5372089 (1994-12-01), Yoshida et al.
patent: 5387443 (1995-02-01), Ota et al.
patent: 5468806 (1995-11-01), Yamamoto et al.
patent: 5496595 (1996-03-01), Ueda et al.
patent: 5497254 (1996-03-01), Amako et al.
patent: 5539567 (1996-07-01), Lin et al.
patent: 5578350 (1996-11-01), Mai et al.
patent: 5650378 (1997-07-01), Iijima et al.
patent: 5672211 (1997-09-01), Mai et al.
patent: 5759265 (1998-06-01), Nashimoto et al.
patent: 5786023 (1998-07-01), Maxwell et al.
patent: 6054226 (2000-04-01), Takeda et al.
patent: 6113701 (2000-09-01), Yamazaki
patent: 6312134 (2001-11-01), Jain et al.
patent: 6312768 (2001-11-01), Rode et al.
patent: WO 01/79935 (2001-04-01), None
International Search Report mailed Nov. 27, 2002 from the European Patent Office—7 pages.

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