System and method for suppression of wafer temperature drift...

Details System and method for suppression of wafer temperature drift... System and method for suppression of wafer temperature drift...

2011-04-12

2011-04-12

Lund, Jeffrie R (Department: 1716)

Coating apparatus

Program, cyclic, or time control

C118S666000, C118S715000, C118S724000, C118S725000, C118S728000, C118S730000, C427S008000, C427S248100

Reexamination Certificate

active

07921802

ABSTRACT:
An apparatus and corresponding method are disclosed that uses one or more optical fibers in a susceptor that monitor radiation emitted by the backside of the susceptor. The optical fibers are filtered and converted into an electrical signal. A control system is used to maintain a constant wafer temperature by keeping the electrical signal constant during the deposition cycle. This overcomes problems caused by varying wafer temperature during non-selective epitaxial and poly-silicon growth on patterned wafers at low temperatures and reduced pressure.

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PCT Invitation to pay Additional Fees, Jun. 17, 2004, pp. 4.

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