System and method for supporting and rotating substrates in a pr

Details System and method for supporting and rotating substrates in a pr System and method for supporting and rotating substrates in a pr

1993-08-17

1994-06-28

Bueker, Richard

Coating processes

Coating by vapor, gas, or smoke

Moving the base

4272481, 118500, 118730, 118733, C23C 1600

Patent

active

053245407

ABSTRACT:
A system for supporting and rotating substrates in a process chamber comprising a first exhaust vacuum pump for exhausting the process chamber, a shaft vertically extending into the process chamber to support wafers in it, bearings for supporting the shaft rotatable, a mechanism for rotating the shaft together with the wafers, a bearing casing for covering the bearings and communicated with the process chamber, a second exhaust vacuum pump for exhausting the bearing casing, and a controller for controlling the first and second exhaust vacuum pumps in such a way that the bearing casing is exhausted by the second exhaust vacuum pump before the process chamber is exhausted by the first exhaust vacuum pump.

REFERENCES:
patent: 5016567 (1991-05-01), Iwabuchi
patent: 5058526 (1991-10-01), Matsushita

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