System and method for supplying photoresist

Details System and method for supplying photoresist System and method for supplying photoresist

2005-04-19

2005-04-19

Kaufman, Joseph A. (Department: 3754)

Dispensing

Processes of dispensing

C222S061000, C222S066000, C222S135000, C222S152000

Reexamination Certificate

active

06880724

ABSTRACT:
A photoresist supply system includes a storage bottle and a reservoir coupled in flow communication therewith. A vacuum pump is coupled in flow communication with the reservoir and creates a vacuum within the reservoir that draws photoresist out of the storage bottle and into the reservoir. An inlet into the reservoir is configured to flow photoresist down an inner wall of the reservoir. The photoresist flows out of the reservoir into a dispense reservoir from which the photoresist is pumped to a dispense nozzle for application to a wafer or substrate.

REFERENCES:
patent: 5156298 (1992-10-01), LaRue
patent: 5405443 (1995-04-01), Akimoto et al.
patent: 6021921 (2000-02-01), Lan et al.
patent: 6640996 (2003-11-01), Jones et al.

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