System and method for single image focus assessment

Details System and method for single image focus assessment System and method for single image focus assessment

2005-03-03

2010-02-23

Mehta, Bhavesh M (Department: 2624)

Image analysis

Image enhancement or restoration

Focus measuring or adjusting

Reexamination Certificate

active

07668388

ABSTRACT:
An image focus assessment method is provided that works reliably for images of a variety of relatively dissimilar workpieces or workpiece features. The focus assessment method is based on analysis of a single image (without the benefit of comparison to other images). The robustness of the focus assessment method is enhanced by the use of at least one classifier based on a plurality of focus classification features. In one application, a primary advantage of assessing focus from a single image is that an overall workpiece inspection time may be reduced by avoiding running an autofocus routine if an image is already in focus. In various embodiments, the focus assessment method may include an ensemble of classifiers. The ensemble of classifiers can be trained on different training data (sub)sets or different parameter (sub)sets, and their classification outcomes combined by a voting operation or the like, in order to enhance the overall accuracy and robustness of the focus assessment method.

REFERENCES:
patent: 4519041 (1985-05-01), Fant et al.
patent: 4876728 (1989-10-01), Roth
patent: 4965443 (1990-10-01), Yamasaki et al.
patent: 5181258 (1993-01-01), Nagao et al.
patent: 5227830 (1993-07-01), Yoshihara et al.
patent: 5291563 (1994-03-01), Maeda
patent: 5311600 (1994-05-01), Aghajan et al.
patent: 5854855 (1998-12-01), Errico et al.
patent: 6542180 (2003-04-01), Wasserman et al.
patent: 6597381 (2003-07-01), Eskridge et al.
patent: 6753919 (2004-06-01), Daugman
patent: 6987876 (2006-01-01), Silber et al.
patent: 2002/0172420 (2002-11-01), Nicolas
patent: 2003/0033436 (2003-02-01), Weiss
patent: 2003/0095710 (2003-05-01), Tessadro
patent: 2005/0109959 (2005-05-01), Wasserman et al.
patent: 2006/0153471 (2006-07-01), Lim et al.
Bryll, Robert, et al., “Attribute Bagging: Improving Accuracy of Classifier Ensembles by Using Random Feature Subsets,”Pattern Recognition 36:1291-1302, 2003.
Kautsky, J., et al., “A New Wavelet-Based Measure of Image Focus,”Pattern Recognition Letters 23:1785-1794, 2002.
QVPAK 3D CNC Vision Measuring Machine Operation Guide, Version 2.0, Manual No. 4911GB, Series No. 359, Mitutoyo Corporation & Micro Encoder Inc., Kanagawa, Japan, Sep. 1996.
QVPAK 3D CNC Vision Measuring Machine User's Guide, Version 7, 1st ed., Manual No. 99MCB225A, Series No. 359, Mitutoyo Corporation & Micro Encoder Inc., Kanagawa, Japan, Jan. 2003.

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