System and method for reducing particles and contamination...

Details System and method for reducing particles and contamination... System and method for reducing particles and contamination...

2011-07-12

2011-07-12

Johnston, Phillip A (Department: 2881)

Radiant energy

Ionic separation or analysis

With sample supply means

C250S492210

Reexamination Certificate

active

07977628

ABSTRACT:
An ion implantation system comprising an ion source configured to generate an ion beam along a beam path, a mass analyzer is located downstream of the ion source wherein the mass analyzer is configured to perform mass analysis of the ion beam and a beam complementary aperture located downstream of the mass analyzer and along the beam path, the beam complementary aperture having a size and shape corresponding to a cross-sectional beam envelope of the ion beam.

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