Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2008-01-01
2008-01-01
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S394000
Reexamination Certificate
active
07314689
ABSTRACT:
A method and system is disclosed for processing one or more oblique features on a mask or reticle substrate. After aligning the mask or reticle substrate with a predetermined reference system, an offset angle of a feature to be processed on the mask or reticle substrate with regard to either the horizontal or vertical reference direction of the predetermined reference system is determined. The mask or reticle substrate is rotated in a predetermined direction by the offset angle; and the feature on the mask or reticle substrate is processed using the predetermined reference system wherein the feature is processed in either the horizontal or vertical reference direction thereof.
REFERENCES:
patent: 5969800 (1999-10-01), Makinouchi
patent: 7094312 (2006-08-01), Libby et al.
patent: 2002/0028399 (2002-03-01), Nakasuji et al.
Mutsunori Igarashi et al., “A Diagonal-Interconnect Architecture and its Application to RISC Core Design”, ISSCC 2002, Session 12a, 3 pages.
Hsieh Hong Chang
Ku Yao Ching
Lin Burn Jeng
Lin Chin Hsian
Yang Ping
Duane Morris LLP
Rosasco S.
Taiwan Semiconductor Manufacturing Co. Ltd.
LandOfFree
System and method for processing masks with oblique features does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with System and method for processing masks with oblique features, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for processing masks with oblique features will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2800844