System and method for polarization characteristic...

Optics: measuring and testing – By light interference – Having polarization

Reexamination Certificate

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C356S515000

Reexamination Certificate

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07468798

ABSTRACT:
A method for irradiating onto a target optical system plural linearly polarized rays having different polarization directions, and for measuring a polarization characteristic of the target optical system including a birefringence amount R and a fast axis Φ includes the steps of irradiating linearly polarized ray having a polarization direction θ onto the target optical system and obtaining a centroid amount P of the ray that has transmitted through the target optical system, and obtaining the birefringence amount R and the fast axis Φ from P=−R·cos(2θ−Φ) or P=R·cos(2θ−Φ).

REFERENCES:
patent: 6310679 (2001-10-01), Shiraishi
patent: 6404482 (2002-06-01), Shiraishi
patent: 6856345 (2005-02-01), Yamamoto et al.
patent: 6862377 (2005-03-01), Szafraniec et al.
patent: 7126757 (2006-10-01), Mori
patent: 7277182 (2007-10-01), Wegmann et al.
patent: 2003/0086071 (2003-05-01), McGuire
patent: 2003/0086156 (2003-05-01), McGuire
patent: 2003/0086157 (2003-05-01), McGuire
patent: 2003/0086171 (2003-05-01), McGuire
patent: 2003/0099047 (2003-05-01), Hoffman et al.
patent: 2003/0128349 (2003-07-01), Unno
patent: 2004/0008348 (2004-01-01), Kishikawa et al.
patent: 2004/0114150 (2004-06-01), Wegmann et al.
patent: 2004/0263814 (2004-12-01), Unno
patent: 2007/0171427 (2007-07-01), Shiode
patent: 1405633 (2003-03-01), None
patent: 1 818 658 (2007-08-01), None
patent: 11-054411 (1999-02-01), None
patent: 2004-061515 (2004-02-01), None
Y. Unno, Influence of birefringence on the image formation of high-resolution projection optics, Applied Optics, Jul. 1, 2000, pp. 3243-3252, vol. 39, No. 19.
Ebihara et al: “Novel metrology methods for image quality control”, Microelectric Engineering, Elsevier Publishers BV., Amsterdam, NL, vol. 83, No. 4-9, Jan. 19, 2006, pp. 634-639.
Shiode et al: “Study of polarization aberration measurement using SPIN method”, PROC SPIE INT SOC OPT ENG; Proceeding of SPIE—The International Society for Optical Engineering; Optical Microlithography XIX 2006, vol. 6154 III, 2006; pp. 615431-1 -615431-9.
Communication from EPO dated Nov. 5, 2007 including European Search Report dated Oct. 16, 2007.
Chinese Office Action concerning Appln 200710004730.9 dated Sep. 5, 2008 and English Translation.

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