Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2004-01-21
2008-09-09
Hassanzadeh, Parviz (Department: 1792)
Coating apparatus
Gas or vapor deposition
With treating means
C204S192110, C204S192120, C204S192340, C250S489000, C250S492300, C250S492210
Reexamination Certificate
active
07421973
ABSTRACT:
An ion shower comprises a plasma source operable to generate source gas ions within a chamber, and an extraction assembly associated with a top portion of the chamber. The extraction assembly is operable to extract ions from the top portion of the chamber. The ion shower further comprises a workpiece support structure associated with the top portion of the chamber that is operable to secure the workpiece having an implantation surface orientated facing downward toward the extraction assembly for implantation thereof. The ion shower of the present invention advantageously facilitates SIMOX processing with a high oxygen fraction, and uniform beam current for next generation processing.
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“The ULE2 Ion Source Capabilities Important to SOI Technology”, Michael A. Graf, Wade Krull and Victor Beneveniste, Eaton Corporation, Beverly, MA 01915, No date available, 4 pgs.
Benveniste Victor M.
Bradley Michael P.
DiVergili William F.
Kellerman Peter L.
Axcelis Technologies Inc.
Dhingra Rakesh K
Eschweiler & Associates LLC
Hassanzadeh Parviz
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