System and method for performing optical proximity correction on

Details System and method for performing optical proximity correction on System and method for performing optical proximity correction on

1995-03-06

1997-10-28

Louis-Jacques, Jacques

Boots, shoes, and leggings

364488, 364489, 364490, 36447428, 257386, 257390, 257503, G06F 1500, H01L 2976

Patent

active

056823231

ABSTRACT:
The system and method performs optical proximity correction on an integrated circuit (IC) mask design by initially performing optical proximity correction on a library of cells that are used to create the IC. The pre-tested cells are imported onto a mask design. All cells are placed a minimum distance apart to ensure that no proximity effects will occur between elements fully integrated in different cells. An optical proximity correction technique is performed on the mask design by performing proximity correction only on those components, e.g., lines, that are not fully integrated within one cell.

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Otto et al "Automated Optical Proximity Correction--a Rules-Based Approach" Mar. 1994 pp. 278-284.

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