System and method for patterning both sides of a substrate...

Details System and method for patterning both sides of a substrate... System and method for patterning both sides of a substrate...

2008-04-29

2008-04-29

Colilla, Daniel J. (Department: 2854)

Printing

Special article machines

Bed and platen

C264S408000, C264S293000, C264S313000, C425S406000, C430S322000, C430S330000

Reexamination Certificate

active

11224316

ABSTRACT:
Provided are a method and system for imprinting a pattern formed on surfaces of an imprint mask onto a double-sided substrate. A method includes deforming the surfaces of the first and second imprint stamps to produce respective first and second deformed surfaces, each having an arc therein. A Pressure is applied to bring the deformed first and second surfaces into intimate contact with the first and second substrate surfaces, respectively. The applied pressure substantially flattens the deformed surfaces. And to separate the two surfaces, the applied pressure is released.

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