Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2006-07-04
2006-07-04
Nguyen, Kiet T. (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S491100
Reexamination Certificate
active
07071478
ABSTRACT:
A method and system is disclosed for directing charged particles on predetermined areas on a target semiconductor substrate. After aligning a wafer mask with a semiconductor wafer, with the wafer mask having one or more mask patterns thereon, the charged particles are directed to pass through the mask patterns to land on one or more selected areas on the semiconductor wafer.
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Chern John
Guo Jyh-Chyurn
Lai Li-shyue
Lien Wan-Yih
Lin Wen Chin
Duane Morris LLP
Nguyen Kiet T.
Taiwan Semiconductor Manufacturing Co. Ltd.
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