System and method for optimizing the grid and intrafield registr

Details System and method for optimizing the grid and intrafield registr System and method for optimizing the grid and intrafield registr

1994-03-10

1995-08-22

Rosenberger, Richard A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

355 53, G01B 1100

Patent

active

054445388

ABSTRACT:
A system and method according to the invention identify assignable overlay error sources contributing to pattern misregistration on a wafer. Specifically, this system treats the case where a single overlay field from a given layer is sufficiently large to cover two or more fields patterned on any other layer. This system identifies values of correctable coefficients, such that when these values are applied to corrective adjustment to the vector field of measured overlay misregistration, the result tends to reduce the sums of the vector magnitudes to a minimum.

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