System and method for nano-pantography

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S492210, C250S309000, C250S492220, C216S066000, C216S067000, C430S323000, C118S640000

Reexamination Certificate

active

08030620

ABSTRACT:
A method is provided for creating a plurality of substantially uniform nano-scale features in a substantially parallel manner in which an array of micro-lenses is positioned on a surface of a substrate, where each micro-lens includes a hole such that the bottom of the hole corresponds to a portion of the surface of the substrate. A flux of charged particles, e.g., a beam of positive ions of a selected element, is applied to the micro-lens array. The flux of charged particles is focused at selected focal points on the substrate surface at the bottoms of the holes of the micro-lens array. The substrate is tilted at one or more selected angles to displace the locations of the focal points across the substrate surface. By depositing material or etching the surface of the substrate, several substantially uniform nanometer sized features may be rapidly created in each hole on the surface of the substrate in a substantially parallel manner.

REFERENCES:
patent: 3619608 (1971-11-01), Westerberg
patent: 4465934 (1984-08-01), Westerberg et al.
patent: 5378917 (1995-01-01), Chalupka et al.
patent: 6867443 (2005-03-01), Liu et al.
patent: 6914620 (2005-07-01), Yoshida et al.
patent: 6919952 (2005-07-01), Kruit
patent: 7005378 (2006-02-01), Crocker, Jr. et al.
patent: 7091504 (2006-08-01), Wieland et al.
patent: 7109493 (2006-09-01), Eastham
patent: 7118784 (2006-10-01), Xie
patent: 7122827 (2006-10-01), Alizadeh et al.
Xu, et al, “Extraction of a nearly monoenergetic ion beam using a pulsed plasma”, 87 Appl. Phys. Lett. (2005), pp. 041502.
Xu, et al., “Nanopantography: A New Method for Massively Parrallel Nanopatterning over Large Areas”, 5(12) nano Letters (2005), pp. 2563-2568.
Murray, J., Characteristics and Applications of Multiple Beam Machines, 9 Microelectronic Eng. (1989), pp. 305-309.
Ando, et al., “Preliminary experimental study of the multiple ion beam machine”, 6(6) J. Vac. Sci. Tech. B (1988), pp. 2120-2123.
Brodie, et al., “A Multiple-Electron-Beam Exposure System for High-Throughput, Direct-Write Submicrometer Lithography”, 28(11) IEEE Transactions on Electron Devices (1981), pp. 1422-1428.
Heynick, et al., “Projection Electron Lithography Using Aperture Lenses”, 22(7) (1975), pp. 399-409.
Donnelly, et al., Nano-pantography, Dec. 13-15, 2004, NSF Nanoscale Science and Engineering Grantees Conference, NSF NIRT GRANT DMI0303790, pp. 1-3.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

System and method for nano-pantography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System and method for nano-pantography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for nano-pantography will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4268753

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.