System and method for monitoring wafer furnace production...

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

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Details

C700S121000, C700S174000, C702S182000, C438S005000

Reexamination Certificate

active

07151975

ABSTRACT:
A system for monitoring wafer throughput per hour in a wafer furnace includes a database, an analysis unit, a comparison unit, and an output unit. The database includes two or more operation histories of the wafer furnace. The analysis unit is coupled to the database. The analysis unit includes logic that retrieves at least one operation history from the database, determines a standard process time and a specification range for the retrieved operation history, and receives a current process time for the current process. The comparison unit, which is coupled to the analysis unit, includes logic that compares the standard process time and the specification range to the current process time. The output unit, which is coupled to the comparison unit, includes logic that outputs a comparison result. A method for monitoring wafer throughput per hour in a wafer furnace also is described.

REFERENCES:
patent: 2001/0047216 (2001-11-01), Ando
patent: 2002/0072162 (2002-06-01), Dor et al.
patent: 2002/0103563 (2002-08-01), Izawa et al.
patent: 2003/0164932 (2003-09-01), Ikuno et al.
patent: 2004/0073405 (2004-04-01), Karasawa
patent: 2004/0171234 (2004-09-01), Takeno

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