System and method for measuring the microroughness of a surface

Details System and method for measuring the microroughness of a surface System and method for measuring the microroughness of a surface

1996-05-13

1999-03-02

Font, Frank G.

Optics: measuring and testing

By polarized light examination

With light attenuation

G01B 1124

Patent

active

058778608

ABSTRACT:
A system for measuring an amount of microroughness of a surface of a substrate, wherein a first beam of electromagnetic radiation and a second beam of electromagnetic radiation are generated, the first and second beams being substantially parallel and spaced apart from each other so that the first and second beams are substantially non-overlapping, and the first and second beams are focused onto the substrate so that the beams impinge upon a selected area of the surface of the substrate having a surface contour, the surface contour of the substrate causing a scattering of both beams. The scattering of the first and second beams is detected, the amount of scattering corresponding to a microroughness value of the selected area of the substrate, and the microroughness value of the selected area of the substrate is determined from the amount of scattering of the first and second beams. The microroughness measuring system may also be used for controlling a fabrication process.

REFERENCES:
patent: 4498773 (1985-02-01), von Bieren
patent: 4650330 (1987-03-01), Fujita
patent: 4677302 (1987-06-01), Chiu et al.
patent: 5037202 (1991-08-01), Batchelder et al.
patent: 5061070 (1991-10-01), Batchelder et al.
patent: 5133602 (1992-07-01), Batchelder et al.
patent: 5351126 (1994-09-01), Takada et al.
patent: 5355221 (1994-10-01), Cohen et al.
patent: 5473393 (1995-12-01), Manabe
patent: 5548404 (1996-08-01), Kupershmidt et al.
W. Murray Bullis, SEMI (Jan., 1996) "Characterizing microroughness and haze on silicon wafers"- pp. 47-53.

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