System and method for measuring germanium concentration for...

Optics: measuring and testing – Dimension – Thickness

Reexamination Certificate

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C438S008000, C438S014000

Reexamination Certificate

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10811738

ABSTRACT:
A system and method is disclosed for measuring a germanium concentration in a semiconductor wafer for manufacturing control of BiCMOS films. Germanium is deposited over a silicon substrate layer to form a silicon germanium film. Then a rapid thermal oxidation (RTO) procedure is performed to create a layer of thermal oxide over the silicon germanium film. The thickness of the layer of thermal oxide is measured in real time using an interferometer, an ellipsometer, or a spectroscopic ellipsometer. The measured thickness of the layer of thermal oxide is correlated to a germanium concentration of the silicon germanium film using an approximately linear correlation. The correlation enables a value of the germanium concentration in the silicon germanium film to be provided in real time.

REFERENCES:
patent: 5256550 (1993-10-01), Laderman et al.
patent: 5298860 (1994-03-01), Kato
patent: 5476813 (1995-12-01), Naruse
patent: 5818596 (1998-10-01), Imai et al.
patent: 5863807 (1999-01-01), Jang et al.
patent: 5982496 (1999-11-01), Ziger
patent: 6010914 (2000-01-01), Shishiguchi
patent: 6277657 (2001-08-01), Nozawa et al.
patent: 6278519 (2001-08-01), Rosencwaig et al.
patent: 6331890 (2001-12-01), Marumo et al.
patent: 6519045 (2003-02-01), Kwon
patent: 6521041 (2003-02-01), Wu et al.
patent: 6573126 (2003-06-01), Cheng et al.
patent: 6639228 (2003-10-01), Yen
patent: 6731386 (2004-05-01), Dautartas et al.
patent: 6759255 (2004-07-01), Xu et al.
patent: 6895360 (2005-05-01), Liu et al.
patent: 06275689 (1994-09-01), None

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