X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2008-05-13
2008-05-13
Ho, Allen C. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
Reexamination Certificate
active
07372941
ABSTRACT:
A method of analyzing patterns. The method comprises: receiving a first diffraction pattern; receiving a second diffraction pattern; receiving a third diffraction pattern; determining a similarity between the first and second diffraction patterns; determining a similarity between the first and third diffraction pattern; determining a similarity between the second and third diffraction pattern; and performing hierarchical cluster analysis on the first and second diffraction pattern based on the determined similarity.
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Bates Simon
Bugay David E.
Hallenbeck Donald R.
Ivanisevic Igor
Stahly Barbara C.
Finnegan Henderson Farabow Garrett & Dunner LLP
Ho Allen C.
SSCI, Inc.
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