System and method for maskless lithography using an array of...

Details System and method for maskless lithography using an array of... System and method for maskless lithography using an array of...

2007-12-04

2007-12-04

Nguyen, Kiet T. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492220, C378S034000, C355S053000, C355S067000

Reexamination Certificate

active

11082629

ABSTRACT:
A method is disclosed for creating a permanent pattern on a substrate. The method includes the steps of providing an array of photon sources, each of which provides a photon beam, providing an array of focusing elements, each of which focuses an associated photon beam from the array of photon sources onto a substrate, and creating a permanent pattern on a substrate using the array of focusing elements to respectively focus associated photon beams on the substrate.

REFERENCES:
patent: 5900637 (1999-05-01), Smith
patent: 6429443 (2002-08-01), Mankos et al.
patent: 6894292 (2005-05-01), Gil et al.
patent: 2003/0122091 (2003-07-01), Almogy

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