Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2011-03-15
2011-03-15
Rosasco, Stephen (Department: 1721)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S311000
Reexamination Certificate
active
07906253
ABSTRACT:
The present disclosure is directed to a method for preparing photomask patterns for a lithography process that employs a plurality of photomasks. The method comprises receiving data describing a drawn pattern. An edge of the drawn pattern is identified that can be defined using a first photomask and a second photomask, and the first photomask is chosen for patterning the edge. Patterns are formed for the first photomask and the second photomask, wherein the first photomask pattern is formed to pattern the edge, and the second photomask pattern is formed to have a wing adjacent to the edge for protecting the edge from double patterning. A process for patterning an integrated circuit device is also disclosed.
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Aton Thomas J.
Vickery Carl A.
Alam Rashid
Brady III Wade J.
Franz Warren L.
Rosasco Stephen
Telecky , Jr. Frederick J.
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