Radiant energy – Photocells; circuits and apparatus – With circuit for evaluating a web – strand – strip – or sheet
Reexamination Certificate
2005-11-29
2005-11-29
Le, Que T. (Department: 2878)
Radiant energy
Photocells; circuits and apparatus
With circuit for evaluating a web, strand, strip, or sheet
C250S208100
Reexamination Certificate
active
06969864
ABSTRACT:
A system and sensor for measuring, inspecting, characterizing, evaluating and/or controlling optical lithographic equipment and/or materials used therewith, for example, photomasks. In one embodiment, the system and sensor measures, collects and/or detects an aerial image (or portion thereof) produced or generated by the interaction between the photomask and lithographic equipment. An image sensor unit may measure, collect, sense and/or detect the aerial image in situ—that is, the aerial image at the wafer plane produced, in part, by a production-type photomask (i.e., a wafer having integrated circuits formed therein/thereon) and/or by associated lithographic equipment used, or to be used, to manufacture of integrated circuits. A processing unit, coupled to the image sensor unit, may generate image data which is representative of the aerial image by, in one embodiment, interleaving the intensity of light sampled by each sensor cell at the plurality of location of the platform. Notably, many inventions/embodiments are disclosed herein.
REFERENCES:
patent: 4585342 (1986-04-01), Lin et al.
patent: 4701606 (1987-10-01), Tanimoto et al.
patent: 4929083 (1990-05-01), Brunner
patent: 5202748 (1993-04-01), MacDonald et al.
patent: 5235400 (1993-08-01), Terasawa et al.
patent: 5316896 (1994-05-01), Fukuda et al.
patent: 5353116 (1994-10-01), Tanigawa et al.
patent: 5481624 (1996-01-01), Kamon
patent: 5491724 (1996-02-01), Altes
patent: 5594328 (1997-01-01), Lukaszek
patent: 5597868 (1997-01-01), Kunz
patent: 5629772 (1997-05-01), Ausschnitt
patent: 5631731 (1997-05-01), Sogard
patent: 5638211 (1997-06-01), Shiraishi
patent: 5700601 (1997-12-01), Hasegawa et al.
patent: 5746513 (1998-05-01), Renken
patent: 5795688 (1998-08-01), Burdorf et al.
patent: 5828455 (1998-10-01), Smith et al.
patent: 5866935 (1999-02-01), Sogard
patent: 5888675 (1999-03-01), Moore et al.
patent: 5891959 (1999-04-01), Kunz
patent: 5898479 (1999-04-01), Hubbard et al.
patent: 5914774 (1999-06-01), Ota
patent: 5969639 (1999-10-01), Lauf et al.
patent: 5973316 (1999-10-01), Ebbesen et al.
patent: 5978085 (1999-11-01), Smith et al.
patent: 6002740 (1999-12-01), Cerrina et al.
patent: 6005682 (1999-12-01), Wu et al.
patent: RE36509 (2000-01-01), Shigihara
patent: 6040936 (2000-03-01), Kim et al.
patent: 6052238 (2000-04-01), Ebbesen et al.
patent: 6236033 (2001-05-01), Ebbesen et al.
patent: 6240219 (2001-05-01), Gregory
patent: 6268093 (2001-07-01), Kenan et al.
patent: 6278101 (2001-08-01), Puyot
patent: 6285020 (2001-09-01), Kim et al.
patent: 6329112 (2001-12-01), Fukuda et al.
patent: 6335220 (2002-01-01), Shioyama et al.
patent: 6356345 (2002-03-01), McArthur et al.
patent: 6360012 (2002-03-01), Kreuzer
patent: 6362907 (2002-03-01), Stone et al.
patent: 6368763 (2002-04-01), Dirksen et al.
patent: 6451490 (2002-09-01), Advocate et al.
patent: 6459823 (2002-10-01), Altunbasak et al.
patent: 6515272 (2003-02-01), Fontaine et al.
patent: 6534798 (2003-03-01), Scherer et al.
patent: 6542835 (2003-04-01), Mundt
patent: 2001/0055415 (2001-12-01), Nozaki
patent: 2002/0003216 (2002-01-01), Kida et al.
patent: 2002/0005947 (2002-01-01), Golberg et al.
patent: 2002/0036775 (2002-03-01), Wolleschensky et al.
patent: 2002/0041377 (2002-04-01), Hagiwara et al.
patent: 2002/0062206 (2002-05-01), Liebchen
patent: 2002/0067478 (2002-06-01), Karpol et al.
patent: 2002/0070355 (2002-06-01), Ota
patent: 2002/0105629 (2002-08-01), Sandstrom et al.
patent: 2002/0122187 (2002-09-01), Bruce et al.
patent: 2002/0134912 (2002-09-01), Veneklasen et al.
patent: 2002/0145717 (2002-10-01), Baselmans et al.
patent: 2002/0167651 (2002-11-01), Boonman et al.
patent: 2002/0172876 (2002-11-01), Baselmans
patent: 2002/0192598 (2002-12-01), Hirayanagi
patent: 2003/0001107 (2003-01-01), Kroon et al.
patent: 2003/0017805 (2003-01-01), Yeung et al.
patent: 2003/0027057 (2003-02-01), Schroeder et al.
patent: 2003/0027366 (2003-02-01), Dulman et al.
patent: 2003/0042433 (2003-03-01), Kamijo
patent: 2003/0047694 (2003-03-01), Van Der Laan
patent: 0 628 806 (1994-04-01), None
patent: WO 00/59206 (2000-10-01), None
patent: WO 02/17030 (2002-02-01), None
“A New Mask Evaluation Tool, the Microlithography Simulation Microscope Aerial Image Measurement System”, Budd, et al., SPIE vol. 2197, 1994, pp. 530-540.
“Characterization of Lithographic System Performance Through Direct Aerial Image Measurements”, C.H. Fields, SRC/SEMATECH, 1996 (96-MC-500).
“Aerial Image Measurements on a Commericial Stepper”, Fields, et al., SPIE vol. 2197, 1994, pp. 585-595.
“A Novel High-Resolution Large-Field Scan-and-Repeat Projection Lithography System”, K. Jain, SPIE vol. 1463 Optical/Laser Microlithography IV, 1991, pp. 666-677.
“Direct Aerial Image Measurements to Evaluate the Performance of an Extreme Ultraviolet Projection Lithography System”, Fields, et al., J. Vac. Sci. Technol. B, vol. 14, No. 6, Microelectronics and Nanometer Structures, Nov./Dec. 1996, pp. 4000-4003.
“Direct Aerial Image Measurement as a Method of Testing High Numerical Aperture Microlithographic Lenses”, Partlo et al., J. Vac. Sci. Technol. B, vol. 11, No. 6, Nov./Dec. 1993, pp. 2686-2691.
“In Situ Measurement of an Image During Lithographic Exposure”, Brunner et al., IEEE Electron Device Letters, vol. EDL-6, No. 7, Jul. 1985, pp. 329-331.
“Improving Photomask Linewidth Measurement Accuracy via Emulated Stepper Aerial Image Measurement”, J. Potzick, SPIE vol. 2322, Photomask Technology and Management, 1994, pp. 353-359.
“Pattern Shape Analysis Tool for Quantitative Estimate of Photomask and Process”, Yonekura, et al., Proceedings of SPIE vol. 4409, Photomask and Next-Generation Lithography Mask Technology VIII, 2001, pp. 204-211.
“Meeting the Challenge of Advanced Lithography Reticle Inspection”, Zurbrick et al., SPIE vol. 2322, Photomask Technology and Management, 1994, pp. 7-15.
“In Situ Resolution and Overlay Measurement on a Stepper”, Brunner et al., SPIE vol. 565, Micron and Submicron Integrated Circuit Metrology, 1985, pp. 6-13.
“Application of the Aerial Image Measurement System (AIMS™) to the Analysis of Binary Mask Imaging and Resolution Enhancement Techniques”, Martino et al., SPIE vol. 2197, 1994, pp. 573-584.
“Optical Limitations to Cell Size Reduction in IT-CCD Image Sensors”, Satoh et al., IEEE, Transactions on Electron Devices, vol. 44, No. 10, Oct. 1997, pp. 1599-1603.
“Direct Aerial Image Monitoring for Extreme Ultraviolet Lithography Systems”, C.H. Fields, Ph.D. Dissertation Thesis, University of California, Berkeley, Spring 1997.
“Extraordinary optical transmission through sub-wavelength hole arrays”, Ebbesen et al., Nature, vol. 391, Feb. 1998, pp., 1994, pp. 667669.
“Control of Optical Transmission Through Metals Perforated with Subwavelength Hole Arrays”, Kim et al., Optics Letters, vol. 24, No. 4, Feb. 1999, pp. 256-258.
“Image Monitor for Markle-Dyson Optics”, Grenville et al., Journal of Vacuum Science Technology B, vol. 6, No. 11, Nov./Dec. 1993, pp. 2700-2704.
“A General Simulator for VLSI Lithography and Etching Processes: Part I—Application to Projection Lithography”, Oldham et al., IEEE Transactions on Electron Devices, vol. ED-26, No. 4, Apr. 1979, pp. 717-722.
“High-Resolution Lithography with Projection Printing”, H. Moritz, IEEE Transactions on Electron Devices, vol. ED-26, No. 4, Apr. 1979, pp. 705-710.
“Contrast Studies in High-Performance Projection Optics”, Oldham et al., IEEE Transactions on Electron Devices, vol. ED-30, No. 11, Nov. 1983, pp. 1474-1479.
“High Resolution, Low-Voltage Probes from a Field Emission Source Close to the Target Plane”, McCord and Pease, Journal of Vacuum Science Technology B, vol. 1, No. 3, Jan./Feb. 1985, pp. 198-201.
“Near-Field Optics: Microscopy, Spectroscopy, and Surface Modification Beyond the Diffraction Limit&#
Chen Xun
Pease R. Fabian W.
Ye Jun
Brion Technologies, Inc.
Le Que T.
Steinberg Neil A.
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