System and method for leveling semiconductor wafers

Photocopying – Projection printing and copying cameras – Step and repeat

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G03B 2742

Patent

active

052912396

ABSTRACT:
A leveling system (10 and 50) with adjustable light beams (38, 53, 55, 59 and 61) is provided for photolithography processes used in manufacturing integrated circuits. The beams (38, 53, 55, 59 and 61) used to assist with positioning wafer (12) relative to the projection camera lens (90) of the step and repeat camera (92) are adjusted for the exposure field (22 and 70) and the desired chip size. For large beam systems (10), the beam width is modified to match the exposure field (22) dimensions which correspond to the desired chip dimensions. For multiple beam systems (50), the geometric relationship of the beams (53, 55, 57, 59 and 61) relative to each other and the desired exposure field (70) are adjusted to provide optimum leveling of the wafer (12) with respect to the projection camera lens (90).

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Wm. C. Ward, "Volume Production of Unique Plastic Surface-Mount Modules ffor the IBM 80-NS 1-Mbit Dram Chip by Area Wire Bond Techniques," 0569-5503/88/0000-0552, IEEE, pp. 552-557.

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