System and method for inspecting pattern defect

Details System and method for inspecting pattern defect System and method for inspecting pattern defect

1998-04-22

2000-02-29

Kim, Robert H.

Optics: measuring and testing

Inspection of flaws or impurities

356354, 250550, 359561, 359559, G01N 2100

Patent

active

060316071

ABSTRACT:
The invention is a pattern defect inspection system and method for improving the inspection speed, simplifying the system, and enlarging the inspection object, in which a correlation circuit (24) selects from a plurality of reference images in reference image storing means (22) one having the highest correlation with a detection image in detection image storing means (23) and inputs it to a difference circuit (25); the difference circuit (25) forms a difference image based on a reference image from the correlation circuit (24) and a detection image from the detection image storing means (23); a defect decision circuit (26) decides the position and size of a defect in a wafer under test 41, based on the difference image from the difference circuit (25); and the result is inputted to defect information processing means (27) to output as a defect information.

REFERENCES:
patent: 4929081 (1990-05-01), Yamamoto et al.
patent: 5289260 (1994-02-01), Miyazaki et al.
patent: 5379150 (1995-01-01), Miyazaki et al.
patent: 5617203 (1997-04-01), Kobayashi et al.
patent: 5774222 (1998-06-01), Maeda et al.

Affiliated with

Also associated with

Rating

System and method for inspecting pattern defect does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System and method for inspecting pattern defect, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for inspecting pattern defect will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-687956