System and method for independent air bearing zoning for semicon

Abrading – Machine – Rotary tool

Patent

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451288, B24B 2900, B24B 500

Patent

active

061559156

ABSTRACT:
A polishing assembly for CMP of semiconductors includes an air bearing platen having multiple concentric rings of air holes, with each ring defining an air delivery zone. Each ring includes air source holes alternating with air drain holes. A distribution plate is mated with the platen, and the distribution plate has alternating rings of air supply and air exhaust rings. The air supply rings include air supply apertures that are aligned with the air source holes in the platen, and the air exhaust rings include air exhaust apertures that are aligned with the air drain holes in the platen. With this structure, the air distribution profile of each air delivery zone can be established relatively independently of the profiles of the other zones.

REFERENCES:
patent: 5800248 (1998-09-01), Pant et al.
patent: 5987616 (1999-11-01), Suzuki

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