System and method for improving linewidth control in a...

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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C355S067000

Reexamination Certificate

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06888615

ABSTRACT:
Electromagnetic energy is emitted from an illumination source of a lithography device. A portion of the emitted electromagnetic energy passes through an illumination optics module. The illumination optics module includes a one-dimensional optical transform element having a pupil plane. An aperture device having an adjustable aperture is located proximate to the pupil plane so that a portion of the electromagnetic energy received by the one-dimensional optical transform element passes through the aperture of the aperture device. The angular distribution of the electromagnetic energy passing through the illumination optics module is adjusted as a function of illumination field position using the aperture device, thereby improving line width control in the lithography device.

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