Electricity: measuring and testing – Fault detecting in electric circuits and of electric components – Of individual circuit component or element
Patent
1994-09-28
1996-01-30
Wieder, Kenneth A.
Electricity: measuring and testing
Fault detecting in electric circuits and of electric components
Of individual circuit component or element
324750, 324765, 250306, G01B 528
Patent
active
054883059
ABSTRACT:
A potentiometry apparatus for measuring a periodic electrical waveform existing proximate the surface of a sample such as a semiconductor wafer is disclosed herein. The potentiometry apparatus includes a pulse generator for generating a sequence of electrical pulses at a pulse frequency offset from the frequency of the surface waveform by a mixing frequency. A cantilever coupled to the pulse generator serves to carry the electrical pulses to a position proximate the surface of the sample. In a capacitive displacement mode the cantilever is mechanically displaced so as to generate a time-expanded representation of the electrical surface waveform having a repetition frequency equal to the mixing frequency. During displacement mode operation an optical detection circuit may be employed to monitor deflection of the cantilever. In a tunneling current mode the cantilever is again employed to carry the electrical pulses to a position proximate the surface of the sample. In this mode a tunneling current propagating through the cantilever at the mixing frequency provides a time,expanded representation of the electrical surface waveform.
REFERENCES:
patent: 4745362 (1988-05-01), Brust et al.
patent: 4941753 (1990-07-01), Wickramasinghe
patent: 4992659 (1991-02-01), Abraham et al.
patent: 5065103 (1991-11-01), Slinkman et al.
patent: 5103174 (1992-04-01), Wandass et al.
patent: 5185572 (1993-02-01), Yagi et al.
patent: 5267471 (1993-12-01), Abraham et al.
patent: 5319977 (1994-06-01), Quate et al.
patent: 5381101 (1995-01-01), Bloom et al.
patent: 5397896 (1995-03-01), Weiss et al.
Anders et al., "Potentiometry for Thin-Film Structures using Atomic Force Microscopy", J. Vac. Sci Technol. A8(1):394-399 (Jan./Feb. 1990).
Girard, "Developments in Voltage Contrast", Scanning Microscopy 2(1):151-160 (1988) Month Unavailable.
Gopinath et al., "Voltage Contrast: A Review", Scanning Electron Microscopy I:375-380 (1978) Month unavailable.
Grove, "Sampling for Oscilloscopes and Other RF Systems: Dc Through X-Band", IEEE Transactions on Microwave Theory and Techniques MTT-14(12):629-635 (1966) Month unavailable.
Hwang et al., "Applications of Scanning Kelvin Probe Force Microscope (SKPFM) for Failure Analysis", ISTFA '92: The 18th International Symposium for Testing & Failure Analysis, Los Angeles, California, pp. 9-14 (17-23 Oct. 1992).
Martin et al., "High-Resolution Capacitance Measurement and Potentiometry by Force Microscopy", Appl. Phys. Lett. 52(13):1103-1105 (1988) Month unavailable.
Nonnenmacher et al., "Kelvin Probe Force Microscopy", Appl. Phys. Lett. 58(25):2921-2923 (1991) Month unavailable.
Williams et al., "Scanning Capacitance Microscopy on a 25 nm Scale", Appl. Phys. Lett. 52(2):203-205 (1989) Month unavailable.
Bloom David M.
Ho Francis
Hou Alfred S.
The Board of Trustees of the Leland Stanford Junior University
Tobin Christopher M.
Wieder Kenneth A.
LandOfFree
System and method for high-speed potentiometry using scanning pr does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with System and method for high-speed potentiometry using scanning pr, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for high-speed potentiometry using scanning pr will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-158480