System and method for forming a pattern on plain or...

Details System and method for forming a pattern on plain or... System and method for forming a pattern on plain or...

2005-08-23

2005-08-23

Meler, Stephen D. (Department: 2853)

Incremental printing of symbolic information

Ink jet

Combined

C347S009000, C347S107000

Reexamination Certificate

active

06932451

ABSTRACT:
The system and method of the present invention forms an item specific pattern on a plain or holographic metallized film or hot stamp foil, including an embossed substrate with or without holograms. A piezoelectric ink jet printhead includes a plurality of ink jet channels and respective ink jets that receive an etchant-resistant mask material for ejecting etchant-resistant mask material through the respective ink jets onto a metallized surface of the metallized film or hot stamp foil. A controller individually and digitally controls the ejection of etchant-resistant mask material in a programmed manner for ink jet printing on the metallized surface a unique pattern of etchant or etchant-resistant mask. Etchant etches the metallized surface into an item specific pattern using subsequently applied etchant that exposes the metallized surface devoid of the etchant-resistant mask.

REFERENCES:
patent: 4398994 (1983-08-01), Beckett
patent: 4552614 (1985-11-01), Beckett
patent: 4584590 (1986-04-01), Fischbeck et al.
patent: 4610755 (1986-09-01), Beckett
patent: 4668533 (1987-05-01), Miller
patent: 4685997 (1987-08-01), Beckett
patent: 4879568 (1989-11-01), Bartky et al.
patent: 4959120 (1990-09-01), Wilson
patent: 5155498 (1992-10-01), Roy et al.
patent: 5266386 (1993-11-01), Beckett
patent: 5273575 (1993-12-01), de Saint Romain
patent: 5281474 (1994-01-01), Matsuzaki et al.
patent: 5340436 (1994-08-01), Beckett
patent: 5381162 (1995-01-01), Roy et al.
patent: 5406318 (1995-04-01), Moore et al.
patent: 5543009 (1996-08-01), Hayes
patent: 5628921 (1997-05-01), Beckett
patent: 5729365 (1998-03-01), Sweatt
patent: 5787558 (1998-08-01), Murphy
patent: 6196662 (2001-03-01), Voelker et al.
patent: 6218004 (2001-04-01), Shaw et al.
patent: 6257689 (2001-07-01), Yonekubo
patent: 6290315 (2001-09-01), Sayama
patent: 6491385 (2002-12-01), Anagnostopoulos
patent: 6506315 (2003-01-01), Ferro
patent: 6565173 (2003-05-01), Murcia et al.
patent: 2002/0051039 (2002-05-01), Moynihan et al.
patent: 2002/0067391 (2002-06-01), Anagnostopoulos et al.
patent: 2002/0080373 (2002-06-01), Collette et al.
patent: 2002/0117845 (2002-08-01), Ahlers et al.
patent: 2003/0035938 (2003-02-01), Lai
patent: 3740149 (1989-06-01), None
patent: 37 40 149 (1989-06-01), None
patent: 0 930 641 (1999-07-01), None
patent: 0 930 641 (1999-07-01), None
patent: 1 167 038 (2002-01-01), None
patent: 1 167 038 (2002-02-01), None
patent: 2 330 331 (1999-04-01), None
patent: 2 330 331 (1999-04-01), None
patent: WO 01/11426 (2001-01-01), None
patent: 01/11426 (2001-02-01), None

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