System and method for exposing an object to an electrical...

Details System and method for exposing an object to an electrical... System and method for exposing an object to an electrical...

2007-01-30

2007-01-30

Mayekar, Kishor (Department: 1753)

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

With means applying electromagnetic wave energy or...

C118S638000

Reexamination Certificate

active

10462372

ABSTRACT:
Methods and systems are configured to expose an object to an electrical discharge. The system includes a conveyor that conveys the object, a guide that guides the object, and an electrode that provides an electrical discharge. The guide is typically set to guide the object laterally with respect to the direction of the conveyor. The guide is generally used to place an object at a predetermined distance from the electrode. Also, the system may include multiple electrodes. The plural electrodes may be used to treat multiple sides of the object. Also, the electrodes may be positioned such that they are not coplanar with the conveyor. The system is suitably used to treat hollow objects which are in filling positions.

REFERENCES:
patent: 3021270 (1962-02-01), Tarbox et al.
patent: 3385966 (1968-05-01), Rosenthal
patent: 3484363 (1969-12-01), Williams
patent: 5173046 (1992-12-01), Walker
patent: 5426557 (1995-06-01), Blitshteyn et al.
patent: 5458714 (1995-10-01), Brandt et al.
patent: 5472747 (1995-12-01), Poo et al.
patent: 5650028 (1997-07-01), Brandt et al.
patent: 6007784 (1999-12-01), Jorgensen

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