Image analysis – Applications – Manufacturing or product inspection
Patent
1997-06-24
1999-06-29
Boudreau, Leo H.
Image analysis
Applications
Manufacturing or product inspection
430 5, 430 30, G06K 900, G03F 900
Patent
active
059179325
ABSTRACT:
Process steps are provided to analyze image placement on a pre-distorted lithographic mask produced by a lithographic system. Obtain metrology data, form a reference array equal to the design coordinates of the metrology sites. Align the metrology data grid coordinate system to remove rigid body components from the metrology data offsets. Parse the metrology data into one or more correction areas. If the mask is to have its disposition provided according to the statistics of the residual errors in the correction areas, then compute the statistics and compare them to the specifications. Otherwise concatenate the local reference arrays summed with their corresponding correction area center coordinates to form reference mark design location arrays. Concatenate temporary arrays with the mask offsets free of pre-distortion into an array of mask offsets corresponding to desired disposition areas and compute statistical distribution of residual errors in array(s) of mask offsets for disposition. Compare statistical distribution of residual errors determined during computation with the specified statistical distribution of the mask disposition areas to accept or reject the mask.
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Boudreau Leo H.
Crockatt Dale M.
International Business Machines - Corporation
Jones II Graham S.
Mehta Bhavesh
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