System and method for dose control in a lithographic system

Details System and method for dose control in a lithographic system System and method for dose control in a lithographic system

2006-01-24

2006-01-24

Ben, Loha (Department: 2873)

Optical: systems and elements

Optical modulator

C359S291000, C359S224200, C359S618000, C359S619000, C359S622000, C359S627000, C359S855000, C355S053000, C355S055000, C355S067000, C355S069000, C356S317000, C250S548000, C250S492100, C250S461100, C385S140000, C430S030000

Reexamination Certificate

active

06989920

ABSTRACT:
A system and method are used for pulse to pulse dose control in an illumination system, used, for example, in a lithography or a maskless lithography machine. The system and method can be used to decrease effective laser pulse-to-pulse variability in lithographic lasers, allowing adequate dose control using a minimum number of pulses (e.g. as little as one pulse).

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