Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor – Including contaminant removal or mitigation
Reexamination Certificate
2008-07-21
2010-06-22
Richards, N Drew (Department: 2895)
Semiconductor device manufacturing: process
Packaging or treatment of packaged semiconductor
Including contaminant removal or mitigation
C257S682000, C257S777000, C257S085000, C257S621000, C257S774000
Reexamination Certificate
active
07741157
ABSTRACT:
A method of forming a MEMS (Micro-Electro-Mechanical System), includes forming an ambient port through a MEMS cap which defines a cavity containing a plurality of MEMS actuators therein; and bonding a lid arrangement to the MEMS cap to hermetically seal the ambient port.
REFERENCES:
patent: 4357557 (1982-11-01), Inohara et al.
patent: 5822170 (1998-10-01), Cabuz et al.
patent: 6093577 (2000-07-01), Van der Groen et al.
patent: 6316332 (2001-11-01), Lo et al.
patent: 6335224 (2002-01-01), Peterson et al.
patent: 6455398 (2002-09-01), Fonstad, Jr. et al.
patent: 6469909 (2002-10-01), Simmons
patent: 6555904 (2003-04-01), Karpman
patent: 6559530 (2003-05-01), Hinzel et al.
patent: 6576489 (2003-06-01), Leung et al.
patent: 6589625 (2003-07-01), Kothari et al.
patent: 6660614 (2003-12-01), Hirschfeld et al.
patent: 6674140 (2004-01-01), Martin
patent: 6844959 (2005-01-01), Huibers et al.
patent: 6858911 (2005-02-01), Tamura et al.
patent: 6872902 (2005-03-01), Cohn et al.
patent: 6900072 (2005-05-01), Patel et al.
patent: 6900510 (2005-05-01), Tamura et al.
patent: 6902947 (2005-06-01), Chinn et al.
patent: 6906847 (2005-06-01), Huibers et al.
patent: 6917099 (2005-07-01), Hellekson et al.
patent: 7087134 (2006-08-01), Chen et al.
patent: 7204737 (2007-04-01), Ding et al.
patent: 2004/0061207 (2004-04-01), Ding
W. Fadgen, “Electrical Properties of TEOS in MIM Structures,” National Nanofabrication Users Network, pp. 46-47.
M. Laczka, et. al., Application of Sol-Gel Method to Obtain Various Types of Materials, 1 page.
Chen Chien-Hua
Haluzak Charles C
Piehl Arthur
Shih Jennifer
Chhaya Swapneel
Hewlett--Packard Development Company, L.P.
Richards N Drew
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