System and method for direct bonding of substrates

Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor – Including contaminant removal or mitigation

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S682000, C257S777000, C257S085000, C257S621000, C257S774000

Reexamination Certificate

active

07741157

ABSTRACT:
A method of forming a MEMS (Micro-Electro-Mechanical System), includes forming an ambient port through a MEMS cap which defines a cavity containing a plurality of MEMS actuators therein; and bonding a lid arrangement to the MEMS cap to hermetically seal the ambient port.

REFERENCES:
patent: 4357557 (1982-11-01), Inohara et al.
patent: 5822170 (1998-10-01), Cabuz et al.
patent: 6093577 (2000-07-01), Van der Groen et al.
patent: 6316332 (2001-11-01), Lo et al.
patent: 6335224 (2002-01-01), Peterson et al.
patent: 6455398 (2002-09-01), Fonstad, Jr. et al.
patent: 6469909 (2002-10-01), Simmons
patent: 6555904 (2003-04-01), Karpman
patent: 6559530 (2003-05-01), Hinzel et al.
patent: 6576489 (2003-06-01), Leung et al.
patent: 6589625 (2003-07-01), Kothari et al.
patent: 6660614 (2003-12-01), Hirschfeld et al.
patent: 6674140 (2004-01-01), Martin
patent: 6844959 (2005-01-01), Huibers et al.
patent: 6858911 (2005-02-01), Tamura et al.
patent: 6872902 (2005-03-01), Cohn et al.
patent: 6900072 (2005-05-01), Patel et al.
patent: 6900510 (2005-05-01), Tamura et al.
patent: 6902947 (2005-06-01), Chinn et al.
patent: 6906847 (2005-06-01), Huibers et al.
patent: 6917099 (2005-07-01), Hellekson et al.
patent: 7087134 (2006-08-01), Chen et al.
patent: 7204737 (2007-04-01), Ding et al.
patent: 2004/0061207 (2004-04-01), Ding
W. Fadgen, “Electrical Properties of TEOS in MIM Structures,” National Nanofabrication Users Network, pp. 46-47.
M. Laczka, et. al., Application of Sol-Gel Method to Obtain Various Types of Materials, 1 page.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

System and method for direct bonding of substrates does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System and method for direct bonding of substrates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for direct bonding of substrates will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4171403

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.