System and method for developing production nano-material

Details System and method for developing production nano-material System and method for developing production nano-material

2007-06-26

2007-06-26

Lindsay, Jr., Walter (Department: 2812)

Semiconductor device manufacturing: process

Having organic semiconductive component

C257SE21327

Reexamination Certificate

active

10944481

ABSTRACT:
A method for developing a manufacturing process includes measuring, in a first testing environment, a primary property of a nano-engineered material at one or more positions to provide one or more measurements. The method also includes determining whether the one or more measurements satisfy a first tolerance criterion and taking a further action based on whether the one or more measurements satisfy the first tolerance criterion. Additionally, a method of measuring thermal properties of a nano-engineered material includes irradiating a nano-engineered material with laser radiation, wherein the laser radiation impinges on a first surface of the nano-engineered material at one ore more locations, capturing at least one image of the nano-engineered material, and analyzing the at least one image to characterize the thermal properties of the nano-engineered material.

REFERENCES:
patent: 5946930 (1999-09-01), Anthony
patent: 5965267 (1999-10-01), Nolan et al.
patent: 6407922 (2002-06-01), Eckblad et al.
patent: 6467951 (2002-10-01), Ghoshal
patent: 6936496 (2005-08-01), Meyer et al.
patent: 2003/0116503 (2003-06-01), Wang et al.
patent: 2003/0117770 (2003-06-01), Montgomery et al.
patent: 2005/0164432 (2005-07-01), Lieber et al.
patent: 2003062116 (2003-07-01), None
patent: WO 02/84757 (2002-10-01), None

Affiliated with

Also associated with

Rating

System and method for developing production nano-material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System and method for developing production nano-material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for developing production nano-material will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3858891