System and method for detecting defects in semiconductor wafers

Radiant energy – Photocells; circuits and apparatus – With circuit for evaluating a web – strand – strip – or sheet

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S559040, C250S225000, C356S237400, C356S364000

Reexamination Certificate

active

10413657

ABSTRACT:
A system and method for detecting defects in semiconductor wafers in a rapid non-destructive manner. Defects in semiconductor wafers can include micropipes and screw dislocations, stress striations, planer defects, polytype inclusions, and others. When a wafer is illuminated by polarized light, the defects induce birefringence of the polarized light that can be visualized by a polariscope to detect defects in wafers. Defects can cause linearly inputted polarized light to emerge as elliptically polarized light after transmission through a wafer having defects. Placing the wafer between a set of polarizers under the cross poles condition allows for a rapid non-destructive system and method for delineating and locating defects within a semiconductor wafer.

REFERENCES:
patent: 5248876 (1993-09-01), Kerstens et al.
patent: 6825487 (2004-11-01), Preece
patent: 6900892 (2005-05-01), Shchegrov et al.
patent: 2003/0178588 (2003-09-01), Ota
patent: 2004/0087112 (2004-05-01), Liu

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

System and method for detecting defects in semiconductor wafers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System and method for detecting defects in semiconductor wafers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for detecting defects in semiconductor wafers will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3807903

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.