System and method for deflecting and focusing a broad ion beam

Details System and method for deflecting and focusing a broad ion beam System and method for deflecting and focusing a broad ion beam

1980-12-31

1983-04-26

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

With target means

2504522, H01J 3708

Patent

active

043814530

ABSTRACT:
A method and system for deflecting a broad ion plasma beam which includes an ion source for forming an ion plasma, an extraction means for extracting a broad ion plasma beam from the ion plasma, and deflection means including a non-grounded surface located in the path of the ion plasam beam and at an angle to the path for deflecting the ion plasma beam to a target material. A grounded, screen grid is located in front of the deflecting means in the path of the ion plasma. The screen grid has openings which permit passage of the ions in the ion plasma, but block passage of the electrons. The plasma beam is deflected by the deflection means and the grounded, screen grid onto the target material for sputter cleaning, deposition and ion milling applications.

REFERENCES:
patent: 2762916 (1956-09-01), Van Overbeek
patent: 3629578 (1971-12-01), LePoole
patent: 3913320 (1975-10-01), Reader et al.

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