System and method for defect localization on electrical test...

Optics: measuring and testing – Inspection of flaws or impurities – Surface condition

Reexamination Certificate

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C382S145000, C382S128000, C382S112000, C382S149000, C257S072000, C257S048000, C356S237100, C438S015000, C438S016000, C438S014000

Reexamination Certificate

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07969564

ABSTRACT:
A method and system for defect localization includes: (i) receiving a test structure that includes at least one conductor that is at least partially covered by an electro-optically active material; (ii) providing an electrical signal to the conductor, such as charge at least a portion of the conductor; and (iii) imaging the test structure to locate a defect.

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Applied Materials Israel, Ltd.; CN Application No. 200380101404.X; Office Action dated Jun. 27, 2008; 6pp.
International Search Report, PCT/US2003/031398, Mar. 19, 2004, 6pp.

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