System and method for custom-polarized photolithography...

Details System and method for custom-polarized photolithography... System and method for custom-polarized photolithography...

2005-11-29

2005-11-29

Nguyen, Hung Henry V. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S067000

Reexamination Certificate

active

06970233

ABSTRACT:
In one embodiment, a system for custom-polarized photolithography illumination includes an illuminator operable to generate an illumination pattern of light, a polarizer unit operable to variably polarize the light, and a mask pattern defining photolithographic pattern features in two dimensions. The mask pattern is associated with a mask capable of transmitting at least a portion of the variably polarized light through the mask pattern.

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patent: 6522392 (2003-02-01), Muller-Rissmann et al.
patent: 6809794 (2004-10-01), Sewell
patent: 2001/0019404 (2001-09-01), Schuster et al.
B.W. Smith, J. Cashmore, “Challenges in high NA, polarization, and photoresists,” Proceedings of SPIE vol. 4691, pp. 11-24.
T.A. Brunner, et al., “High NA lithographic imagery at Brewster's angle,” Proceedings of SPIE vol. 4691, pp. 1-10.

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