System and method for curing polymeric/photoresist coatings

Coating apparatus – With heat exchange – drying – or non-coating gas or vapor...

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118688, 118712, 73 232, 73150R, 374 53, 422105, 436 55, 436 85, B05C 1100, G01N 700, G01N 1700, G01N 326, G05B 100

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active

060773502

ABSTRACT:
The present invention provides a system and method for thermally curing polymeric coated substrates by effective drying of solvents used in the production of the coated component. A feedback system coupled to a heating apparatus is comprised of one or more gas sensors internal or external to the heating apparatus to provide monitoring of the quantity of solvent gases being generated. The present invention allows the curing process to be precisely controlled, where, for example, a predetermined concentration of solvent gases input to the gas sensor can trigger the heating process to be stopped or to provide for a controlled cool down period for curing of the photoresist substrate. A controller coupled between the gas sensor and the heating apparatus may also contain temperature and/or time controls for varying the output of the heating apparatus in response to indications from the gas sensor. The system of the present invention assures production of stable photoresist coatings and also minimizes the processing time needed to properly cure the polymeric coated substrates.

REFERENCES:
patent: 3746509 (1973-07-01), Koskan
patent: 4670400 (1987-06-01), Leenders et al.
patent: 5525051 (1996-06-01), Takano
patent: 5663211 (1997-09-01), Kominami et al.

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