System and method for controlling composition for...

Radiant energy – Invisible radiant energy responsive electric signalling – Infrared responsive

Reexamination Certificate

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C250S339110

Reexamination Certificate

active

11075806

ABSTRACT:
A system and a method for controlling the multi-component composition such as photoresist, stripper, developer, etchant, thinner, rinser/cleaner and etch bead remover, for a lithography process, which is used for manufacturing a semiconductor device, a liquid crystal display device and so on, are disclosed. The system includes a composition circulator for withdrawing the composition from a storage tank retaining the composition for a lithography process, and for recycling the withdrawn composition to the storage tank, through a flow cell; a composition analyzer for measuring an absorbance of the composition passing through the flow cell, and for calculating the concentration of at least one component of the composition from the measured absorbance; a component supplier for supplying a deficient component to the storage tank when a concentration of the deficient component is below a predetermined level; and a controller for controlling the component supplier to adjust the concentration of each component of the composition according to the absorbance.

REFERENCES:
patent: 7127358 (2006-10-01), Yue et al.
patent: 2003/0138710 (2003-07-01), Park et al.
patent: 2003/0235997 (2003-12-01), Lee et al.
patent: 2004/0180269 (2004-09-01), Balasubramaniam et al.

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