Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Waste gas purifier
Reexamination Certificate
2011-03-29
2011-03-29
Duong, Tom (Department: 1774)
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
Waste gas purifier
C423S210000, C423S239100
Reexamination Certificate
active
07914747
ABSTRACT:
A system is provided for reducing NOxemission. The system includes a gas production source configured to produce a gas stream comprising NOx, and an oxidation catalyst positioned downstream of the gas production source. The oxidation catalyst is configured to oxidize NO gas molecules in the gas stream to yield higher order NxOymolecules. A removal system is positioned downstream of the oxidation catalyst and is configured to remove higher order NxOymolecules from the gas stream by solvent absorption or reaction. The system further includes a secondary NOxtrimming system positioned downstream of the oxidation catalyst, wherein the secondary NOxtrimming system is configured to inject a reactant into the gas stream, the reactant configured to react with NOxmolecules present in the gas stream.
REFERENCES:
patent: 3959440 (1976-05-01), Mizuno et al.
patent: 5237939 (1993-08-01), Spokoyny et al.
patent: 5308810 (1994-05-01), Voss et al.
patent: 5775266 (1998-07-01), Ziegler
patent: 6696031 (2004-02-01), Twigg et al.
patent: 7118721 (2006-10-01), Rini et al.
patent: 2002/0182122 (2002-12-01), Wietzke et al.
patent: 2008/0233026 (2008-09-01), Laslo
patent: 2010/0221164 (2010-09-01), Lee et al.
Duong Tom
General Electric Company
Sutherland & Asbill & Brennan LLP
LandOfFree
System and method for controlling and reducing NO x emissions does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with System and method for controlling and reducing NO x emissions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for controlling and reducing NO x emissions will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2659694