System and method for controlled release of vapors

Details System and method for controlled release of vapors System and method for controlled release of vapors

1987-03-05

1988-06-28

Kashnikow, Andres

Fluid sprinkling, spraying, and diffusing

Processes

Involving slow diffusion

239 56, A61L 912

Patent

active

047533897

ABSTRACT:
An improved system and method for providing a controlled release of vapors from a vaporizable material such as a fragrance material provided in a container for air freshening. The system includes a sealable container containing a porous reservoir medium, which contains a liquid fragrance material in communication with a plenum cavity for accumulation of vapors therein without reaching a pressure equilibrium with the liquid source. A permeable barrier is provided between the plenum and the atmosphere for metered release of vapors through an aperture provided in an impermeable barrier to the atmosphere. The reservoir medium contains capillaries and the surface area of the reservoir medium adjacent the plenum is made large compared to that of the apertures in the impermeable barrier. Thus, the conversion of a liquid phase fragrance material in the reservoir absorbent material to vapor phase for dispersal to the surrounding air is controlled so that the service life of the device is substantially extended. A method for making and using the fragrance dispersing system is also disclosed.

REFERENCES:
patent: 1732028 (1929-10-01), Reiner
patent: 3419217 (1968-12-01), White et al.
patent: 4159631 (1979-07-01), Lee
patent: 4277024 (1981-07-01), Spector
patent: 4356969 (1982-11-01), Obermayer et al.

Affiliated with

Also associated with

Rating

System and method for controlled release of vapors does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System and method for controlled release of vapors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for controlled release of vapors will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1911067