Photocopying – Projection printing and copying cameras – With temperature or foreign particle control
Reexamination Certificate
2005-10-25
2010-11-09
Kim, Peter B (Department: 2882)
Photocopying
Projection printing and copying cameras
With temperature or foreign particle control
Reexamination Certificate
active
07830493
ABSTRACT:
A system and method are used to compensate for thermal effect on a lithographic apparatus. The system comprises a patterning device, a projection system, a substrate position controller, and a substrate-position-based expansion-compensator. The patterning device modulates a radiation beam. The projection system projects the modulated radiation beam onto a target portion of a substrate. The substrate position controller moves the substrate relative to the projection system sequentially through a plurality of exposure positions. The substrate-position-based expansion-compensator interacts with the substrate position controller to modify the exposure positions in order at least partially to compensate for thermally-induced geometrical changes of at least one of the substrate and projection system.
REFERENCES:
patent: 4668077 (1987-05-01), Tanaka
patent: 4669842 (1987-06-01), Yomoda et al.
patent: 5117255 (1992-05-01), Shiraishi et al.
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5500736 (1996-03-01), Koitabashi et al.
patent: 5523193 (1996-06-01), Nelson
patent: 5530482 (1996-06-01), Gove et al.
patent: 5579147 (1996-11-01), Mori et al.
patent: 5581324 (1996-12-01), Miyai et al.
patent: 5610965 (1997-03-01), Mori et al.
patent: 5677703 (1997-10-01), Bhuva et al.
patent: 5808797 (1998-09-01), Bloom et al.
patent: 5834785 (1998-11-01), Coon et al.
patent: 5912096 (1999-06-01), Hada
patent: 5953106 (1999-09-01), Unno et al.
patent: 5982553 (1999-11-01), Bloom et al.
patent: 6061119 (2000-05-01), Ota
patent: 6088080 (2000-07-01), Itoh
patent: 6133986 (2000-10-01), Johnson
patent: 6177980 (2001-01-01), Johnson
patent: 6373619 (2002-04-01), Sandstrom
patent: 6377334 (2002-04-01), Whiting
patent: 6416913 (2002-07-01), Suzuki
patent: 6424879 (2002-07-01), Chilese et al.
patent: 6654660 (2003-11-01), Singh et al.
patent: 6687041 (2004-02-01), Sandstrom
patent: 6747783 (2004-06-01), Sandstrom
patent: 6795169 (2004-09-01), Tanaka et al.
patent: 6806897 (2004-10-01), Kataoka et al.
patent: 6811953 (2004-11-01), Hatada et al.
patent: 6909588 (2005-06-01), Moffatt
patent: 7151588 (2006-12-01), Franken et al.
patent: 7385675 (2008-06-01), George et al.
patent: 7561251 (2009-07-01), Van Der Feltz et al.
patent: 2002/0146628 (2002-10-01), Ota
patent: 2004/0012404 (2004-01-01), Feder et al.
patent: 2004/0041104 (2004-03-01), Liebregts et al.
patent: 2004/0084633 (2004-05-01), Moffatt
patent: 2004/0130561 (2004-07-01), Jain
patent: 2005/0007572 (2005-01-01), George et al.
patent: 2005/0213067 (2005-09-01), Van Der Feltz et al.
patent: 2007/0008531 (2007-01-01), Smeets
patent: 2007/0026325 (2007-02-01), Maria et al.
patent: 2007/0075315 (2007-04-01), Venema et al.
patent: 2007/0257209 (2007-11-01), Ottens et al.
patent: 1 482 375 (2004-12-01), None
patent: 1 513 021 (2007-10-01), None
patent: 2 321 316 (1998-07-01), None
patent: 60-78454 (1985-05-01), None
patent: 4-192317 (1992-07-01), None
patent: 5-315222 (1993-11-01), None
patent: 6-063948 (1994-03-01), None
patent: 6-181168 (1994-06-01), None
patent: 10-328732 (1998-12-01), None
patent: 2004-363590 (2004-12-01), None
patent: WO 97/14077 (1997-04-01), None
patent: WO 98/33096 (1998-07-01), None
patent: WO 98/38597 (1998-09-01), None
patent: WO 00/72090 (2000-11-01), None
U.S. Appl. No. 11/257,398, filed Oct. 2005, Venema et al.
U.S. Appl. No. 11/175,033, filed Jul. 2005.
U.S. Appl. No. 11/192,400, filed Jul. 2005.
Third Notice of Allowance mailed Feb. 23, 2009 for U.S. Appl. No. 10/811,070, 6 pgs.
Sixth Non-Final Rejection mailed Oct. 31, 2008 for U.S. Appl. No. 10/811,070, 6 pgs.
Second Notice of Allowance mailed Sep. 25, 2008 for U.S. Appl. No. 10/811,070, 6 pgs.
Fifth Non-Final Rejection mailed Jun. 27, 2008 for U.S. Appl. No. 10/811,070, 8 pgs.
Notice of Allowance mailed Apr. 4, 2008 for U.S. Appl. No. 10/811,070, 4 pgs.
Second Final Rejection mailed Dec. 27, 2007 for U.S. Appl. No. 10/811,070, 6 pgs.
Fourth Non-Final Rejection mailed Jul. 26, 2007 for U.S. Appl. No. 10/811,070, 7 pgs.
Third Non-Final Rejection mailed Feb. 27, 2007 for U.S. Appl. No. 10/811,070, 6 pgs.
Final Rejection mailed Sep. 5, 2006 for U.S. Appl. No. 10/811,070, 9 pgs.
Second Non-Final Rejection mailed Mar. 13, 2006 for U.S. Appl. No. 10/811,070, 7 pgs.
Non-Final Rejection mailed Oct. 28, 2005 for U.S. Appl. No. 10/811,070, 7 pgs.
Response to Japanese Office Action (Notification of Reasons for Refusal) mailed Jun. 9, 2009 for Japanese Application No. 2005-092136, 4 pgs.
Notice of Reasons for Refusal for Japanese Patent Application No. 2006-272435 mailed Dec. 8, 2009, 4 pgs.
Translation of Office Action for Korean Application No. 10-2006-0097120 completed on Nov. 14, 2007, 5 pgs.
Translation of Office Action for Korean Application No. 10-2007-0048873 mailed Aug. 20, 2007, 8 pgs.
European Search Report for European Application No. 05251565.7 mailed on Jul. 25, 2005.
Maria Zaal Koen Jacobus Johannes
Tinnemans Patricius Aloysius Jacobus
Venema Willem Jurrianus
ASML Netherlands B.V.
Kim Peter B
Liu Chia-how Michael
Sterne Kessler Goldstein & Fox P.L.L.C.
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