System and method for cleaning a semiconductor wafer

Details System and method for cleaning a semiconductor wafer System and method for cleaning a semiconductor wafer

1996-08-20

1999-09-07

Warden, Jill

Cleaning and liquid contact with solids

Processes

With treating fluid motion

134 2, 134 251, 134182, 134186, 134902, B08B 300

Patent

active

059481730

ABSTRACT:
A system and method for cleaning semiconductor wafers, includes an internal cleaning tank having an outlet and a cassette for holding wafers, and a device disposed near the outlet of the internal cleaning tank for releasing a cleaning solution so as to increase a flow rate of the cleaning solution by creating a spiral flow of the cleaning solution, an external cleaning tank having an intake through which the cleaning solution is supplied to clean the wafers in the internal cleaning tank, a circulating pipe for connecting the outlet to the intake, a circulating pump formed in the middle section of the circulating pipe to repeatedly circulate that cleaning solution, and a filter for filtering the used cleaning solution circulated by the circulating pump to return the cleaning solution to the internal cleaning tank through the intake. The device prevents contaminating materials from adhering to the semiconductor wafers by spirally drawing out the used cleaning solution from the internal tank.

REFERENCES:
patent: 4633893 (1987-01-01), McConnell et al.
patent: 4899767 (1990-02-01), McConnell et al.
patent: 4955402 (1990-09-01), Miranda
patent: 5292373 (1994-03-01), Arita et al.
patent: 5571367 (1996-11-01), Nakajime et al.

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