Hazardous or toxic waste destruction or containment – Destruction or containment of radioactive waste – Chemical conversion to a stable solid for disposal
Reexamination Certificate
2006-06-01
2009-11-24
Group, Karl E (Department: 1793)
Hazardous or toxic waste destruction or containment
Destruction or containment of radioactive waste
Chemical conversion to a stable solid for disposal
C588S001000, C588S020000, C422S159000, C422S903000
Reexamination Certificate
active
07622627
ABSTRACT:
A system for chemically decontaminating radioactive material.
REFERENCES:
patent: 4217192 (1980-08-01), Lerch et al.
patent: 4226640 (1980-10-01), Bertholdt
patent: 4287002 (1981-09-01), Torok
patent: 4508641 (1985-04-01), Hanulik
patent: 4756768 (1988-07-01), Bertholdt et al.
patent: 4942594 (1990-07-01), Bertholdt et al.
patent: 5640703 (1997-06-01), Brierley et al.
patent: 5752206 (1998-05-01), Frink et al.
patent: 5958247 (1999-09-01), Bertholdt et al.
patent: 6319391 (2001-11-01), Holderness et al.
patent: 2005/0124842 (2005-06-01), Paris et al.
patent: 44 10 747 (1995-10-01), None
patent: 0 533 494 (1993-03-01), None
patent: 5-209997 (1993-08-01), None
patent: 7-140296 (1995-06-01), None
patent: 9-159798 (1997-06-01), None
patent: 9-510784 (1997-10-01), None
patent: 2000-81498 (2000-03-01), None
patent: 2002-250794 (2002-09-01), None
patent: 2003-50296 (2003-02-01), None
U.S. Appl. No. 11/443,106, filed May 31, 2006, Enda, et al.
U.S. Appl. No. 12/278,864, filed Aug. 8, 2008, Enda, et al.
Enda Masami
Inami Ichiro
Kanasaki Takeshi
Sakai Hitoshi
Sato Mitsuyoshi
Group Karl E
Kabushiki Kaisha Toshiba
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Wiese Noah S
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